AccuThermo AW 810 快速退火爐 或保護(hù)氣氛熱處理爐
- 公司名稱 Allwin21 Corp
- 品牌
- 型號 AccuThermo AW 810
- 產(chǎn)地 USA
- 廠商性質(zhì) 生產(chǎn)廠家
- 更新時間 2017/7/12 14:32:20
- 訪問次數(shù) 2991
聯(lián)系我們時請說明是化工儀器網(wǎng)上看到的信息,謝謝!
快速退火爐AG Heatpulse 610; AG Heatpulse 4100 ;AG Heatpulse 4108; 打膠機(jī) GASONICS AURA 1000 ; GASONICS AE2001; GASONICS AE 2000LLL; 打膠機(jī) MATRIX 105/106/303/403 ; 等離子刻蝕機(jī) TEGAL 901/903; 探針臺 EG2001; EG 2010; EG 1034; 測試儀 HP4062;HP4145; AW-PCM測試軟件.〈br〉
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Allwin21 Corp (www.allwin21.com) 是一家總部設(shè)在美國硅谷的專業(yè)半導(dǎo)體設(shè)備與技術(shù)服務(wù)公司。我公司可提供全新的或翻新的快速退火爐或保護(hù)氣氛熱處理爐 AccuThermo AW 410,AccuThermo AW 610,AccuThermo AW 810,Heatpulse AG610 、;EG2001/2010/1034探針臺;HP4062/HP4145測試儀;AW-PCM測試軟件
• 歐姆接觸快速合金;
• 硅化物合金退火;
• 氧化物生長;
• 其它快速熱處理工藝。
Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610. Allwin21 is manufacturing the AccuThermo AW-610,AccuThermo AW 810,originally the AG Heatpulse 610.The AccuThermo AW-610,AccuThermo AW 810 have innovative softwaremore advanced temperature control technologies.
AccuThermo AW 810 is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber''s cold-wall design, superior heating uniformity advanced temperature control technologyAW 900 new software, provide significant advantages over conventional furnace processingconventional RTP systems.
Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. The wafers must be brought down (temperature) slow enough however, so they do not break due to thermal shock..Such rapid heating rates are attained by high intensity lamps process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflowchemical vapor deposition.
Rapid thermal anneal (RTA) is a process used in semiconductor device fabrication which consists of heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Rapid thermal anneals are performed by equipment that heats a single wafer at a time using lamp based heating that a wafer is brought near. Unlike furnace anneals they are short in duration, processing each wafer in several minutes. Rapid thermal anneal is a subset of processes called Rapid Thermal Process (RTP).
AG Associates Heatpulse is one of the most famous RTP equipment manufacturers. Many Integrated Chip companies, R&D centers, Institutes all over the world have been using AG Heatpulse Systems.
Allwin21 Corp can provide the following refurbished RTP equipment
- AG Heatpulse 210
- AG Heatpulse 410
- AG Heatpulse 610
Heatpulse 210 Heatpulse 610
Allwin21 Corp. can also provide Allwin21 Corp proprietary AW Control SoftwareSuperior Temperature Control Technology to upgrade the refurbished equipment which provides the following significant advantages
- Integrated process control system
- Real time graphics display
- Real time process data acquisition, display,analysis
- Programmed comprehensive calibrationdiagnostic functions
- Better performancemaintenance than the original systems
Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610. Allwin21 is manufacturing the AccuThermo AW-610,originally the AG Heatpulse 610.The AccuThermo AW-610 has innovative softwaremore advanced temperature control technologies.
New AccuThermo AW 610
New AccuThermo AW 810M
AccuThermo AW 810’s key features include:
- Advanced ERP Pyrometer for precise high temperature measurement
- Add timer watch for the oven safety issue (the original has no safety interlock for the computer locks up, chamber would be burned if the computer locks up when process running).
- The new software with power summary function to detect either lamp failure or sensor failure
- Manual Operation
- Use Sumpower as a parameter to control the uniformity of the wafer.
- Closed-loop temperature control with pyrometer or thermocouple temperature sensing.
- Precise time-temperature profiles tailored to suit specific process requirements.
- High-intensity visible radiation heats wafers for short periods. Fast heatingcooling rates unobtainable in conventional technologies.
- Consistent wafer-to-wafer process cycle repeatability.
- Elimination of external contamination.
- Small footprintenergy efficiency.
- Software calibrationeasy to be done.
- More functionsI/O hardware “exposed” for easier maintenancetrouble shooting.
- It is easy to edit recipe with GUIgraph display.
- Save all process data on the computer hard disk.
- A/DD/A precision is 14 to 16 bits.
- Detect in processwith color curve displayed on the screen.
- Lamp damage detect in process.
- Sensor status detect function.
- On line help function
AccuThermo AW 810 RTA RTP is a versatile tool, which is useful for many applications:
• Ion Implant Activation
• Polysilicon Annealing
• Oxide Reflow
• Silicide Formation
• Contact Alloying
• OxidationNitridation
• GaAs Processing
For a bibliographyreprints of technical journal articles regarding these AccuTherm applications, contact the Allwin21 Corp. Marketing Communications Department.